With submissions from nearly 3,000 photographers, this year’s contest has been one of the most successful since its inception in 2001. “Given the exceptional talents of the 100 finalists, though, it was very difficult for the international Hasselblad panel to select only 10 winners”, says Christian Nørgaard, Hasselblad´s Photographer Relations Manager.
The Hasselblad Masters program is again created in collaboration with HP, Hahnemuehle, SanDisk, and Broncolor. HP printed last year the 100 finalist images with their Designjet Z3200 Photo Printer on the TIPA award-winning Photo Rag Baryta paper from Hahnemuehle. TIPA-winning Broncolor - for Best Studio Flash Generator: Broncolor Scoro A4S - was providing high-end lighting equipment for the exhibition, and SanDisk is supplying CompactFlash memory cards to the winners, as they did last year.
The ten winners will each have access to Hasselblad’s flagship camera system, the H4D, to contribute to the second annual commemorative Masters book featuring their individual photographic interpretations of the theme “emotion”. The Hasselblad Masters book Vol. 2 will be released at Photokina 2010, the bi-annual international photographic tradeshow in Cologne, Germany, in addition to a large exhibit of the Masters’ photographs, which will be viewed by almost two hundred thousand of Photokina attendees.

Masters 2009, Up-and-Coming
Lyle Owerko, NYC, USA

Masters 2009, Wedding
Joao Carlos, NYC, USA

Masters 2009, Portrait
Claudio Napolitano, Miami, USA
Caracas, Venezuela

Masters 2009, Fashion
Dirk Rees, London, UK

Masters 2009, Product
Mark Holthusen, San Francisco, USA
The 2009 Hasselblad Masters Awards winners are:
| Up-and-Coming: | Lyle Owerko, NYC, USA |
| Wedding: | Joao Carlos, NYC, USA |
| Portrait: | Claudio Napolitano, Miami, USA / Caracas, Venezuela |
| Fashion: | Dirk Rees, London, UK |
| Product: | Mark Holthusen, San Francisco, USA |
| Fine Art: | Quentin Shih, Beijing, China |
| Architecture: | Stephan Zirwes, Stuttgart, Germany |
| Landscape: | Bang Peng, Hong Kong |
| Editorial: | Nina Berman, NYC, USA |
| General: | Mark Zibert, Toronto, Canada |

Masters 2009, Fina Art
Quentin Shih, Beijing, China

Masters 2009, Architecture
Stephan Zirwes, Stuttgart, Germany

Masters 2009, Landscape
Bang Peng, Hong Kong

Masters 2009, Editorial
Nina Berman, NYC, USA

Masters 2009, General
Mark Zibert, Toronto, Canada